ALD on Textiles
Atomic layer deposition (ALD) is a deposition technique commonly used in microelectronics that allows temperature-sensitive materials such as polymeric materials to be coated with thin films at low temperatures. It is also a versatile technique for functionalizing textile substrates due to its ability to form compatible films on the fiber surface. So by using this method in our lab, we compose thin films on textiles and produce new featured materials.
Evaluation of TiO2 and ZnO atomic layer deposition coated polyamide 66 fabrics for photocatalytic activity and antibacterial applications, H.I. Akyildiz, S. Diler, S. Islam, Journal of Vacuum Science and Technology A, (2021)
Photocatalyst Thin Films
Our main research interest is to coat Nano thin films on textile materials and other materials to impart various functional properties to use for a different purpose. We are currently developing a sustainable, economical, and efficient way to eliminate textile wastewater’s toxicity by using atomic layer deposition (ALD) photocatalyst thin films and Solar energy. We aim to develop visible light sensible photocatalyst thin films by using different thin film methods and materials for environmental and renewable energy applications.
Immobilization of ZnO thin films onto fibrous glass substrates via atomic layer deposition and investigation of photocatalytic activity, S. Islam, H.I. Akyildiz, Journal of Materials Science: Materials in Electronics, (2021)
Sol-Gel and Aerogel Material
We study the synthesis flexible of silica aerogel materials and aerogel blankets that are durable and applicable to challenging and harsh thermal environments. Understanding how aerogels form also helps us vary the products’ properties via chemical modifications to bring new features.
Thermal and Mechanical Properties of Sol-Gel Silica Coated Fabrics, A. Tav, Y. Öz, H.I. Akyildiz, European Journal of Science and Technology, (2021)
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